PerkinElmer NexION 5000 Cleanroom ICP-MS

PerkinElmer NexION 5000 Cleanroom ICP-MS

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Product Details:

Voltage 230 V AC, 50/60 Hz
Feature Simultaneous multi-element detection, low background noise, fast transient signal acquisition
Measurement Range Parts-per-trillion (ppt) to parts-per-million (ppm) levels
Capacity High-throughput, capable of analyzing trace elements at parts-per-trillion (ppt) levels
Temperature Range Ambient laboratory temperatures, typically 15C to 30C
Frequency RF generator: 40 MHz
Automation Grade Fully automated
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PerkinElmer NexION 5000 Cleanroom ICP-MS Price And Quantity

PerkinElmer NexION 5000 Cleanroom ICP-MS Product Specifications

Model No NexION 5000
Power Source AC Mains
Core Components RF plasma source, quadrupole mass filter, ion detector, auto-sampler
Usage Ultra-trace elements analysis, semiconductor and electronics cleanroom applications
Accuracy Up to 0.5% RSD (Relative Standard Deviation)
Automation Grade Fully automated
Frequency RF generator: 40 MHz
Type Quadrupole ICP-MS (Inductively Coupled Plasma Mass Spectrometer)
Temperature Range Ambient laboratory temperatures, typically 15C to 30C
Display Type Large touchscreen LCD control panel
Capacity High-throughput, capable of analyzing trace elements at parts-per-trillion (ppt) levels
Measurement Range Parts-per-trillion (ppt) to parts-per-million (ppm) levels
Dimension (L*W*H) 81 cm x 76 cm x 76 cm
Feature Simultaneous multi-element detection, low background noise, fast transient signal acquisition
Equipment Materials Cleanroom-compatible stainless steel and specialized polymers
Voltage 230 V AC, 50/60 Hz
Weight Approximately 140 kg (instrument only)

Detection Limit Sub-ppt for key semiconductor crictical elements
Software Syngistix ICP-MS software platform
Gas Flow Control Variable Argon flow up to 20 L/min
Plasma Torch Design Robust, high-stability, with enhanced contamination control
Sample Throughput Up to 240 samples per batch
Operating Environment Class 10 or better cleanroom
Interface USB, Ethernet, and remote service capability
Cleaning Mode Automated system cleaning protocols for cleanroom compliance
Nebulizer Type Concentric glass nebulizer

Product Description

Brand PerkinElmer

Model 5000

Capacity 34 MHz

CAT No N8160010

Application Spectroscopy

The NexION 5000 multi-quadrupole ICP-MS is innovatively designed to meet and exceed the demanding requirements of ultra-trace elemental applications. It delivers exceptionally low background equivalent concentrations and outstanding detection limits, key to ensuring accurate, repeatable results. Plus, it provides superior interference removal, phenomenal stability and unmatched matrix tolerance, for results you can count on. Discover how the NexION 5000 takes ICP-MS performance beyond traditional triple quad.

Robust Design for Cleanroom Applications

The NexION 5000's construction features cleanroom-compatible stainless steel and specialized polymers, ensuring compatibility with Class 10 or better environments. Its innovative plasma torch enhances system stability, while comprehensive contamination controls support reliable results at extremely low detection limits. This makes the instrument ideally suited for critical semiconductor and electronics analysis.

High Sample Throughput & Automation

Maximize productivity with the system's ability to process up to 240 samples per batch, supported by a fully automated cleaning mode to maintain compliance and minimize cross-contamination. Automated protocols and high-capacity sample handling are paired to deliver consistent results with minimal operator intervention, ensuring efficiency in high-demand settings.

Advanced Software & Connectivity

Managed through the SyngistixTM ICP-MS software, operation is intuitive and flexible, offering remote service capabilities via USB and Ethernet. The large touchscreen LCD control panel further streamlines workflows, while advanced features like variable argon flow up to 20 L/min and fast transient signal acquisition optimize analysis across a broad concentration range.

FAQ's of PerkinElmer NexION 5000 Cleanroom ICP-MS:

Q: How does the NexION 5000 ICP-MS control contamination in cleanroom environments?

A: The instrument utilizes a robust plasma torch design, cleanroom-compatible materials, and automated cleaning protocols to maximize contamination control. It is built for use in Class 10 or better cleanrooms, ensuring ultra-low background levels and reliable detection of trace elements.

Q: What elements can be detected and at what sensitivity?

A: The NexION 5000 is designed to detect key semiconductor-critical elements with detection limits reaching the sub-ppt (parts-per-trillion) range, providing exceptional sensitivity for ultra-trace-level analyses across a wide spectrum of elements.

Q: When should the automated cleaning protocols be used?

A: Automated cleaning protocols are recommended between sample batches or as specified in your laboratory's quality procedures. Regular use maintains optimal cleanliness, minimizes cross-contamination risks, and upholds cleanroom compliance.

Q: Where can the NexION 5000 be installed?

A: This system is specifically engineered for installation in high-grade cleanrooms-Class 10 or better-commonly found in semiconductor, electronics, or ultra-trace-level analytical laboratories.

Q: How does the SyngistixTM software platform benefit users?

A: SyngistixTM ICP-MS software provides an intuitive interface for streamlined operation, method setup, and data management. It supports remote service connectivity and advanced workflow automation, enabling efficient and user-friendly instrument control.

Q: What is the typical process for running a batch of samples?

A: Users load up to 240 samples into the auto-sampler, configure parameters using the touchscreen or software, and initiate the run. The instrument automates sample introduction, data acquisition, routine cleaning, and records trace-level results with high accuracy.

Q: What are the key benefits of using the NexION 5000 in semiconductor applications?

A: The key benefits include ultra-low detection limits, high analytical throughput, robust contamination control, fully automated workflows, and dependable accuracy-vital for ensuring semiconductor and electronics manufacturing quality.

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